Banerjee, Ratnabali and Ray, Swati and Batabyal, A K and Barua, A K and Sen, Ssuchitra (1985) Structural characterization of tin doped indium oxide films prepared by magnetron sputtering. Journal of Materials Science, 20 (8). pp. 2937-2944. ISSN 0022-2461

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Abstract

The structural characteristics of transparent and conducting thin films of tin doped indium oxide (ITO) have been studied by X-ray diffraction and electron microscopy. The ITO films have been prepared by radio frequency sputtering employing a planar magnetron configuration. The effects of variation of substrate temperature and annealing have been studied. Films deposited at substrate temperatures up to 230° C show a marked �1 1 0� preferred orientation, whereas those deposited at 330° C are preferentially oriented in the �3 1 1� direction. Transmission electron micrographs of ITO films deposited on KCI crystals show the possible effects of strain on the structure, which are minimized to a great extent by annealing. © 1985 Chapman and Hall Ltd.

Item Type:	Article
Subjects:	Engineering Materials
Divisions:	UNSPECIFIED
Depositing User:	Bidhan Chaudhuri
Date Deposited:	19 May 2016 11:49
Last Modified:	19 May 2016 11:49
URI:	http://cgcri.csircentral.net/id/eprint/3351

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