Majumder, Mousumi and Biswas, I and Pujaru, S and Chakraborty, A K (2015) Cuprous oxide thin films grown by hydrothermal electrochemical deposition technique. Thin Solid Films, 589. pp. 741-749. ISSN 0040-6090

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Abstract

Semiconducting cuprous oxide films were grown by a hydrothermal electro-deposition technique on metal (Cu) and glass (ITO) substrates between 60 degrees C and 100 degrees C. X-ray diffraction studies reveal the formation of cubic cuprous oxide films in different preferred orientations depending upon the deposition technique used. Film growth, uniformity, grain size, optical band gap and photoelectrochemical response were found to improve in the hydrothermal electrochemical deposition technique. (C) 2015 Elsevier B.V. All rights reserved.

Item Type:	Article
Subjects:	Engineering Materials
Divisions:	UNSPECIFIED
Depositing User:	Bidhan Chaudhuri
Date Deposited:	30 Dec 2015 12:17
Last Modified:	30 Dec 2015 12:17
URI:	http://cgcri.csircentral.net/id/eprint/3029

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