Mukhopadhyay, S S and Kundu, Dipali (2013) A new method for on-line dissolution and determination of trace impurities in high silica material using inductively coupled plasma atomic emission spectrometry. Journal of the Indian Chemical Society, 90 (9). pp. 1335-1339. ISSN 0019-4522

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Abstract

A simple and rapid method has been developed for on-line dissolution of high silica material followed by the determination of trace impurities in ICP-AES. High silica material was placed in a mixture of HF and water (1 : 2) inside a polypropylene bottle. After capping the lid, the bottle was kept at room temperature (25 +/- 5) degrees C for 45 min with occasional manual shaking. The resultant solution in HF was tested for metallic trace impurities directly in ICP-AES. The test result of the rapid dissolution technique was checked with those obtained by conventional dissolution of the material in supra pure HF. The results obtained by two different sample dissolution techniques were in very good agreement. Accuracy of the method has been verified by analyzing certified reference high silica materials like quartz, SAB, SARM 49 and high purity silica, BCS-CRM.313/1.

Item Type:	Article
Subjects:	Microstructure and Characterization
Divisions:	UNSPECIFIED
Depositing User:	Bidhan Chaudhuri
Date Deposited:	21 May 2015 07:00
Last Modified:	21 May 2015 07:00
URI:	http://cgcri.csircentral.net/id/eprint/2832

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