Singh, Shiv Prakash and Karmakar, Basudeb (2011) In situ electron beam irradiated rapid growth of bismuth nanoparticles in bismuth-based glass dielectrics at room temperature. Journal of Nanoparticle Research, 13 (9). pp. 3599-3606. ISSN 1388-0764

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Abstract

In this study, in situ control growth of bismuth nanoparticles (Bi(0) NPs) was demonstrated in bismuth-based glass dielectrics under an electron beam (EB) irradiation at room temperature. The effects of EB irradiation were investigated in situ using transmission electron microscopy (TEM), selected-area electron diffraction and high-resolution transmission electron microscopy. The EB irradiation for 2-8 min enhanced the construction of bismuth nanoparticles with a rhombohedral structure and diameter of 4-9 nm. The average particle size was found to increase with the irradiation time. Bismuth metal has a melting point of 271 A degrees C and this low melting temperature makes easy the progress of energy induced structural changes during in situ TEM observations. This is a very useful technique in nano-patterning for integrated optics and other applications.

Item Type:	Article
Uncontrolled Keywords:	Bismuth nanoparticles; Transmission electron microscopy; Glass; Nano patterning
Subjects:	Glass Electronics
Divisions:	UNSPECIFIED
Depositing User:	Bidhan Chaudhuri
Date Deposited:	18 Jan 2012 06:41
Last Modified:	31 Jan 2013 11:37
URI:	http://cgcri.csircentral.net/id/eprint/354

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