Sarkar, Saswati and Biswas, Prasanta Kumar and Jana, Sunirmal (2012) Nano silver coated patterned silica thin film by sol-gel based soft lithography technique. Journal of Sol-Gel Science and Technology, 61 (3). pp. 577-584. ISSN 0928-0707

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Abstract

We report the fabrication of nano silver coated patterned silica thin film by sol-gel based soft lithography technique. Initially, silica gel film on soda lime silica glass was prepared by dipping technique from a silica sol of moderate silica concentration. A PolydimethylSiloxane elastomeric stamp containing the negative replica of the patterns of commercially available compact disc was used for embossing the film and the embossed film was cured up to 450 degrees C in pure oxygen atmosphere for oxide film. Finally, a precursor solution of AgNO3 in water containing polyvinyl alcohol as an organic binder was made and used for coating on the patterned silica film by dipping technique and cured the sample up to 450 degrees C in reducing gas atmosphere to obtain nano silver layer. The formation of only cubic silver (similar to 4.0 nm) and both cubic silver (similar to 5.2 nm) and silver oxide (similar to 3.6 nm) crystallites at 350 and 450 degrees C film curing temperatures respectively were confirmed by XRD measurements. The % of nano silver metal and silver oxide were 75.4 and 24.6 respectively. The nano-structured surface feature was visualized by FESEM whereas AFM revealed the high fidelity grating structure of the films. Presence of both spherical and rectangular structure (aspect ratio, 2.37) of nano silver/silver oxide was confirmed by TEM. The films were also characterized by UV-Vis spectral study. The patterned film may find application in chemical sensor devices.

Item Type:	Article
Uncontrolled Keywords:	Sol-gel processing; Soft lithography; Patterning of thin films; Nano metal; Microstructure
Subjects:	Engineering Materials
Divisions:	Sol Gel
Depositing User:	Bidhan Chaudhuri
Date Deposited:	05 Jun 2012 10:10
Last Modified:	05 Jun 2012 10:10
URI:	http://cgcri.csircentral.net/id/eprint/1474

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