Vishwas, M and Sharma, Sudhir Kumar and Rao, K Narasimha and Mohan, S and Gowda, K V Arjuna and Chakradhar, R P S (2009) Optical, dielectric and morphological studies of sol-gel derived nanocrystalline TiO(2) films. Spectrochimica Acta Part A-Molecular and Biomolecular Spectroscopy, 74 (3). pp. 839-842. ISSN 1386-1425

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Abstract

Nanocrystalline TiO(2) films have been synthesized on glass and silicon substrates by sol-gel technique. The films have been characterized with optical reflectance/transmittance in the wavelength range 300-1000nm and the optical constants (n, k) were estimated by using envelope technique as well as spectroscopic ellipsometry. Morphological studies have been carried Out using atomic force microscope (AFM). Metal-Oxide-Silicon (MOS) capacitor was fabricated using conducting coating on TiO(2) film deposited on silicon. The C-V measurements show that the film annealed at 300 degrees C has a dielectric constant of 19.80. The high percentage of transmittance, low surface roughness and high dielectric constant suggests that it can be used as an efficient anti-reflection coating on silicon and other optical coating applications and also as a MOS capacitor. (C) 2009 Elsevier B.V. All rights reserved.

Item Type:	Article
Uncontrolled Keywords:	Thin films; Chemical synthesis; Microscopy; Optical properties; Dielectric response
Subjects:	Engineering Materials
Divisions:	Glass
Depositing User:	Bidhan Chaudhuri
Date Deposited:	02 Mar 2012 08:01
Last Modified:	01 Apr 2016 06:01
URI:	http://cgcri.csircentral.net/id/eprint/1130

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