Kanungo, J and Maji, S and Mandal, Ashok Kumar and Sen , Suchitra and Bontempi, E and Balamurugan, A K and Tyagi, A K and Uvdal, K and Sinha, S K and Saha, H and Basu, S (2010) Surface treatment of nanoporous silicon with noble metal ions and characterizations. Applied Surface Science, 256 (13). pp. 4231-4240. ISSN 0169-4332

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Abstract

A very large surface to volume ratio of nanoporous silicon (PS) produces a high density of surface states, which are responsible for uncontrolled oxidation of the PS surface. Hence it disturbs the stability of the material and also creates difficulties in the formation of a reliable electrical contact. To passivate the surface states of the nanoporous silicon, noble metals (Pd, Ru, and Pt) were dispersed on the PS surface by an electroless chemical method. GIXRD (glancing incidence X-ray diffraction) proved the crystallinity of PS and the presence of noble metals on its surface. While FESEM (field emission scanning electron microscopy) showed the morphology, the EDX (energy dispersive X-ray) line scans and digital X-ray image mapping indicated the formation of the noble metal islands on the PS surface. Dynamic SIMS (secondary ion mass spectroscopy) further confirmed the presence of noble metals and other impurities near the surface of the modified PS. The variation of the surface roughness after the noble metal modification was exhibited by AFM (atomic force microscopy). The formation of a thin oxide layer on the modified PS surface was verified by XPS (X-ray photoelectron spectroscopy). (C) 2010 Elsevier B. V. All rights reserved.

Item Type:	Article
Uncontrolled Keywords:	Porous silicon; Surface treatment; Noble metals; Morphology; Surface oxide
Subjects:	Microstructure and Characterization
Divisions:	UNSPECIFIED
Depositing User:	Bidhan Chaudhuri
Date Deposited:	13 Feb 2012 10:36
Last Modified:	06 Mar 2012 10:34
URI:	http://cgcri.csircentral.net/id/eprint/794

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