Debnath, Radhaballabh (2000) Copper-associated aluminum ionized center [AlO4-/Cu++](+) in a gamma-irradiated copper (I)-containing silica glass. Journal of Materials Research, 15 (3). 824 -831. ISSN 0884-2914

[img] PDF - Published Version
Restricted to Registered users only

Download (196Kb) | Request a copy

Abstract

A new type of aluminum ionized center associated with the copper ion [AlO4-/Cu++](+) has been observed in a copper(I)-containing silica glass upon gamma-irradiation at room temperature. The center, unlike many other previously reported monovalent cation-compensated aluminum ionized hole centers [AlO4/M+](+), where M+ = H+, Li+, Na+, Ag+, etc., behaves more like a simple ionized center rather than an ionized hole center. We argue that complete compensation of the hole on the aluminum ion of the center becomes possible because of the compensating copper ion. This is accomplished by the donation of an electron by the cuprous ion to the neighboring irradiation-generated [AlO4](0) hole via that oxygen atom of the (AlO4), which is nearest to the cation.

Item Type: Article
Subjects: Glass
Divisions: Glass
Depositing User: Mrs Chandana Patra
Date Deposited: 09 Feb 2012 08:19
Last Modified: 05 Mar 2016 15:31
URI: http://cgcri.csircentral.net/id/eprint/711

Actions (login required)

View Item View Item