Sinha, S K and Bhattacharya, R. and Ray, S K and Manna, Indranil (2011) Influence of deposition temperature on structure and morphology of nanostructured SnO(2) films synthesized by pulsed laser deposition. Materials Letters, 65 (2). pp. 146-149. ISSN 0167-577X

[img] PDF - Published Version
Restricted to Registered users only

Download (836Kb) | Request a copy


Nanostructured tin oxide thin films were deposited on the Si (100) substrate using the pulsed laser deposition technique at different substrate temperatures (300, 450 and 600 degrees C) in an oxygen atmosphere. The structure and morphology of the as-deposited films indicate that the film crystallinity and surface topography are influenced by the deposition temperature by changing from an almost amorphous to crystalline microstructure and smoother topography at a higher substrate temperature. The photoluminescence measurement of the SnO(2) films shows three stable emission peaks centered at respective wavelengths of 591, 554 and 560 nm with increasing deposition temperature, contributed by the oxygen vacancies. (C) 2010 Elsevier B.V. All rights reserved.

Item Type: Article
Uncontrolled Keywords: Thin films; Defects; PLD; Atomic force microscopy
Subjects: Processing Science
Depositing User: Bidhan Chaudhuri
Date Deposited: 20 Jan 2012 04:46
Last Modified: 29 Mar 2012 12:56

Actions (login required)

View Item View Item