Singh, Shiv Prakash and Karmakar, Basudeb (2011) In situ electron beam irradiated rapid growth of bismuth nanoparticles in bismuth-based glass dielectrics at room temperature. Journal of Nanoparticle Research, 13 (9). pp. 3599-3606. ISSN 1388-0764

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In this study, in situ control growth of bismuth nanoparticles (Bi(0) NPs) was demonstrated in bismuth-based glass dielectrics under an electron beam (EB) irradiation at room temperature. The effects of EB irradiation were investigated in situ using transmission electron microscopy (TEM), selected-area electron diffraction and high-resolution transmission electron microscopy. The EB irradiation for 2-8 min enhanced the construction of bismuth nanoparticles with a rhombohedral structure and diameter of 4-9 nm. The average particle size was found to increase with the irradiation time. Bismuth metal has a melting point of 271 A degrees C and this low melting temperature makes easy the progress of energy induced structural changes during in situ TEM observations. This is a very useful technique in nano-patterning for integrated optics and other applications.

Item Type: Article
Uncontrolled Keywords: Bismuth nanoparticles; Transmission electron microscopy; Glass; Nano patterning
Subjects: Glass
Depositing User: Bidhan Chaudhuri
Date Deposited: 18 Jan 2012 06:41
Last Modified: 31 Jan 2013 11:37

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