Mishra, S K and Kumar, Rakesh and Soni, . and Sreemany, M and Pathak, L C (2015) Ultrathin to Nano Thickness TiN Coatings: Processing, Structural, Mechanical Behavior. Journal of Materials Engineering and Performance, 24 (12). pp. 5013-5021. ISSN 1059-9495

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The fabrication of titanium nitride (TiN) thin films with varying thicknesses by reactive magnetron sputtering at different substrate temperatures as well as deposition times has been investigated. With the increase of deposition times from 1 to 120 min, the TiN film thickness is increased from 15 nm to 2.1 A mu m. The effect of thickness and substrate temperature on the mechanical, microstructural, and structural behavior of these fabricated thin TiN films is investigated. The average hardness is found to vary between 22 and 42 GPa and modulus between 300 and 527 GPa. The grain sizes increase with the thickness of the deposited films and it is observed to vary between 20 and 65 nm.

Item Type: Article
Subjects: Engineering Materials
Depositing User: Bidhan Chaudhuri
Date Deposited: 11 May 2016 06:18
Last Modified: 11 May 2016 06:18
URI: http://cgcri.csircentral.net/id/eprint/3327

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