Paul, Mukul Chandra and Sen, Ranjan and Bandyopadhyay, Tarun Kumar (1999) Role of helium in fluorine incorporation for control of preform entry taper. Glass Technology, 40 (4). pp. 127-132. ISSN 0017-1050

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Incorporation of fluorine in silica glass in the presence of helium and oxygen during cladding layer formation by, the modified chemical vapour deposition (MCVD) process has been critically investigated for better control of process parameters to minimise the entry taper loss in the preforms without any adverse effect on fluorine incorporation efficiency. Theoretically, calculated thermal diffusivity values of helium oxygen mixtures have been correlated with experimentally observed deposition length pointing out the anomaly in the existing relations. Variation in the proportion of helium at fixed (O-2+He) partial pressure is found to have minimal effect on fluorine incorporation while increase in He/O-2 ratio in the input gas mixture as well as higher deposition temperature are observed to reduce the entry taper length in the preform.

Item Type: Article
Subjects: Processing Science
Divisions: Fiber Optics and Photonics
Depositing User: Bidhan Chaudhuri
Date Deposited: 19 Jun 2012 06:46
Last Modified: 19 Jun 2012 06:46

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